Oerlikon Systems

Wafer Processing awarded VLSI 10 best ranking #3 for 10th consecutive year.

Wafer Processing awarded VLSI 10 best ranking #3 for nine consecutive year.

Wafer Processing awarded VLSI 10 best ranking for eight consecutive year.

Wafer processing unveils MASK ETCHER V, the fifth generation plasma Photomask etch system enabling 45nm Photomask etching and beyond.

Hard Disk Solution: RACETRACK
Line Solution: INDIGO for BD ROM & INDIGO R/RE for BD R/RE

Multilayer Sputtering Solution: SPRINTER-5 for BD R inorganic media & SPRINTER 750 13ch for MiniDisc
Line Solution: MATRIX for HD-DVD ROM & FUSION for DVD R DL

Flagship Clusterline 200 II latest generation high performance 200mm cluster tool introduced to the market.

Multilayer Sputtering Solution: DVD SPRINTER Ultraspeed 1440 Discs / hour
Sputtering Solution: CUBE STAR 4000 Discs / hour
Line Solution: OFFLINE BONDER for DVD R SL and DL

100^th Photomask Plasma Etch System delivered.
Versaline modular plasma process platform introduced to the market.
Evaporation products divested to Evatech.

Sputtering Solution: SWIVEL 2003 2600 Discs / hour & CUBE LITE 2003
Line Solution: MATRIX for DVD ROM & FUSION for DVD-R

100^th CLUSTERLINE System delivered.

Line Solution: PARAGON for DVD+RW

Unaxis introduced the Clusterline 300 for sputtering of 12” wafer size to the market.

Multilayer Sputtering Solution: SPRINTER 750 13ch
Sputtering Solution: CUBE LITE 2000 & SWIVEL 2000 2400 Discs/h
Hard Disk Solution: CIRCULUS MX & CIRCULUS MX14 II

Starline tool is introduced to the market as a one of a kind back-side metal deposition tool.

Multilayer Sputtering Solution: DVD Sprinter 1000 Discs / hour
Sputtering Solution: PYRAMET Master Metallizer & CDM PLUS Master Metallizer
Hard Disk Solution: CIRCULUS M14

Plasma-Therm merges with Balzers BPS and becomes Unaxis group.

Multilayer Sputtering Solution: Multi SPRINTER 1500 & SPRINTER 750

Sputtering Solution: TWISTER 2 1450 Discs / hour & COMET & SWIVEL98 2200 Discs / hour
Hard Disk Solution: CIRCULUS M14

Multilayer Solution BIG SPRINTER 500
Sputtering Solution: TWISTER 1200 Discs / hour & CUBE LITE

Unaxis introduces the Clusterline 200 to the market, which is their 3^rd gen. multi-chamber PVD cluster tool for up to 200 mm wafers.

Multilayer Solution: SPRINTER 500
Hard Disk Solution: CIRCULUS M12

Multi Layer Solution: SDS 131
Sputtering Solution: CUBE

Flagship Versalock multi-chamber platform for production wafer processing created.

Sputtering Solution: CDI 915 1800 Discs / hour

First ever Photomask plasma etch system introduced to the market. Balzers introduces the LLS 502, the third generation batch sputter system

Multilayer Solution: SDS 100
Sputtering Solution: CDI 901 1000 Discs / hour
Hard Disk Solution: CIRCULUS M8

Merger between Balzers/Liechtenstein and Leybold group in Germany completed.

Plasma-Therm Inc. relocates production facility to Florida

Balzers introduces the LLS 900, the second generation batch sputter system

Balzers launches their 1st gen. innovative high through-put PVD cluster tool called Clusterline 9000.

First production 200mm plasma etch equipment introduced to the market by Plasma- Therm.

Industry first single wafer production plasma etch reactor by Plasma- Therm.

Balzers introduces the SWS the first single wafer sputtering system worldwide.

Balzers introduces the LLS 801 a batch sputter system to the market

Plasma Therm shipped first RF based plasma process equipment.

Plasma-Therm Inc. founded as RF generator and analytical equipment company